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Listing-id : 345262
High-purity amino metal compounds are now available!
Feb 2, 2024 10:08:02 AM
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Amino metal compounds are primarily used as precursors for high-k materials, with a purity level of up to 5N.They are found extensive application in dynamic random-access memory (DRAM), photovoltaic cells, CMOS technology, capacitors, transistors, ferroelectric memory, and high-definition display technologies.
One of our featured products is Pentakis(dimethylamino)tantalum (CAS: 19824-59-0), which serves as a precursor for TaN. It exhibits excellent conductivity and could be used in the electrode manufacturing of semiconductor devices. It is also employed as a diffusion barrier layer in post-processing of semiconductors and for metallization of the positive electrode in photovoltaic cells. Additionally, it serves as a precursor for metal gate materials in CMOS technology below 45nm.
Another noteworthy compound is Tetrakis(dimethylamino)titanium (CAS: 3275-24-9), which is a hot topic in the field of atomic layer deposition (ALD) and chemical vapor deposition (CVD). It serves as a precursor material for TiO2, a crucial high-k and metal gate material in technologies below 32nm. TiO2 can be doped with other compounds to achieve high dielectric constants and low dielectric loss, making it suitable for capacitor and small device manufacturing in random-access memory.
Furthermore, our Tetrakis(dimethylamino)titanium could be used to deposit TiN/TiO2 nanocomposite films, which find applications in dentistry as barrier layers for step-by-step explanations. By combining TDMAT with NH? in plasma-enhanced atomic layer deposition, TiN nanofilms can be obtained, suppressing secondary electron emission on surfaces and enhancing the performance of space vehicles and their components in the field of vacuum electronic devices.
Our high purity amino metal compounds offer exceptional quality and reliability, making them the perfect choice for your advanced electronics needs. We ensure strict quality control measures throughout the production process to guarantee consistent and reliable performance.
If you are interested in learning more about our products, please feel free to reach us at uchemsales@gmail.com or visit our website:www.myuchem.com for more details.
One of our featured products is Pentakis(dimethylamino)tantalum (CAS: 19824-59-0), which serves as a precursor for TaN. It exhibits excellent conductivity and could be used in the electrode manufacturing of semiconductor devices. It is also employed as a diffusion barrier layer in post-processing of semiconductors and for metallization of the positive electrode in photovoltaic cells. Additionally, it serves as a precursor for metal gate materials in CMOS technology below 45nm.
Another noteworthy compound is Tetrakis(dimethylamino)titanium (CAS: 3275-24-9), which is a hot topic in the field of atomic layer deposition (ALD) and chemical vapor deposition (CVD). It serves as a precursor material for TiO2, a crucial high-k and metal gate material in technologies below 32nm. TiO2 can be doped with other compounds to achieve high dielectric constants and low dielectric loss, making it suitable for capacitor and small device manufacturing in random-access memory.
Furthermore, our Tetrakis(dimethylamino)titanium could be used to deposit TiN/TiO2 nanocomposite films, which find applications in dentistry as barrier layers for step-by-step explanations. By combining TDMAT with NH? in plasma-enhanced atomic layer deposition, TiN nanofilms can be obtained, suppressing secondary electron emission on surfaces and enhancing the performance of space vehicles and their components in the field of vacuum electronic devices.
Our high purity amino metal compounds offer exceptional quality and reliability, making them the perfect choice for your advanced electronics needs. We ensure strict quality control measures throughout the production process to guarantee consistent and reliable performance.
If you are interested in learning more about our products, please feel free to reach us at uchemsales@gmail.com or visit our website:www.myuchem.com for more details.
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