UCHEM offers a wide range of carbonyl metal compounds
Jan 22, 2024 09:43:07 AM
UCHEM offers a wide range of carbonyl metal compounds, such as:
Chromium hexacarbonyl (CAS: 13007-92-6)
Perfect for depositing thin films using Laser Chemical Vapor Deposition (LCVD) technique, these compounds are ideal for repairing transparent defects in large-scale integrated circuit photomasks. Unlock the potential of your electronic devices with our high-quality chromium precursor!
Tungsten hexacarbonyl (CAS: 14040-11-0)
Enhance the performance of your LCD and OLED displays with our atomically precise tungsten films. Utilizing Atomic Layer Deposition (ALD) technology, our tungsten compounds offer exceptional electrical and mechanical properties, ensuring top-notch quality for your devices.
Molybdenum hexacarbonyl (CAS: 13939-06-5)
In need of refined molybdenum powder? Our carbonyl molybdenum compounds are the perfect solution. Widely used in the pharmaceutical industry, these materials serve as crucial precursors for molybdenum film deposition, enabling advancements in drug synthesis and more.
Cobalt carbonyl (CAS: 10210-68-1)
Unlock the potential of cobalt with our high-purity carbonyl compounds. From metal extraction to the synthesis of specialty polymers, these compounds find applications in diverse fields such as agriculture, fragrance, and pharmaceuticals.
Ruthenium carbonyl (CAS:15243-33-1)
By utilizing chemical deposition techniques like Chemical Vapor Deposition (CVD) or Atomic Layer Deposition (ALD), Twelve Carbonyl Triruthenium can be used to create ruthenium thin films or ruthenium compound films as thin as 3nm. It can be employed in the production of magnetic storage devices, magnetic sensors, and even as a catalyst for pharmaceutical synthesis.
Potassium hexacyanocobaltate(III) (CAS:13963-58-1)
This is an inorganic compound with a chemical formula of K3[Co(CN)6]. This compound has gained significant attention in the fields of medicine and chemical engineering due to its unique properties and versatile applications.
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